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Deposition and Characterization of p-Cu2O Thin Films

Corresponding Author : M. Rasadujjaman (rana1phyru@gmail.com)

Authors : M. Shahjahan , M. K. R. Khan , M. M. Rahman

Keywords : Cuprous Oxide thin films, Glass substrates, Oxidation method, X-ray diffraction, Spray pyrolysis

Abstract :

In this work we have studied the p-type cuprous oxide (Cu2O) thin film fabricated with thermal oxidation and spray pyrolysis techniques. Cuprous oxide layer was prepared by thermal oxidation method inside a furnace in the temperature range of 930°C - 1010°C. X-ray diffraction studies revealed the formation of single phase cubic Cu2O films. The best quality Cu2O films were obtained at 970°C. The electrical resistivity of the Cu2O layer varies with the variation of temperature and found of the order ~103 Ωcm. Such films have also been prepared on glass substrates by spray pyrolysis technique. Optical study showed that the Cu2O films were highly absorbing in the visible range of electromagnetic radiation. The absorption coefficient, dielectric susceptibility and optical conductivity are evaluated.  

Published on December 30th, 2012 in Volume 20, Issue 3, Applied Sciences and Technology